Low microwave loss in deposited Si and Ge thin-film dielectrics at single-photon power and low temperatures
Published:
Recommended citation: Cameron J. Kopas, Justin Gonzales, Shengke Zhang, D. R. Queen, Brian Wagner, McDonald Robinson, James Huffman, and Nathan Newman , "Low microwave loss in deposited Si and Ge thin-film dielectrics at single-photon power and low temperatures", AIP Advances 11, 095007 (2021) https://doi.org/10.1063/5.0041525 https://dx.doi.org/10.1063/5.0041525
This manuscript investigates the dielectric and two-level-system losses of high-purity deposited amorphous germanium and silicon dielectrics in niobium superconducting microwave waveguide resonators. A preprint version is available on the arXiv at http://arxiv.org/abs/2011.10155.
Recommended citation: ‘Cameron J. Kopas, Justin Gonzales, Shengke Zhang, D. R. Queen, Brian Wagner, McDonald Robinson, James Huffman, and Nathan Newman , “Low microwave loss in deposited Si and Ge thin-film dielectrics at single-photon power and low temperatures”, AIP Advances 11, 095007 (2021) https://doi.org/10.1063/5.0041525 ‘